Awarded without open competition
Awarded without open competition. The buyer went directly to one or a few suppliers instead of advertising the contract. Procurement rules allow this only in specific cases, such as extreme urgency, when only one supplier can do the work, or for call-offs from an existing framework.
Key facts
- Buyer
- University Of Edinburgh · Body governed by public law
- Supplier
- JEOL UK Ltd
- Value
- £2,398,869
- Procedure
- Award procedure without prior publication of a call for competition
- Sector
- Laboratory & precision equipment · Laboratory, optical and precision equipments (excl. glasses) (CPV 38000000)
- Region
- Scotland
- Official notice
- 018498-2026 on Find a Tender
- Timeline
-
- Contract date19 Feb 2026
- Published2 Mar 2026Published 11 days after the contract date
Description
The University has a requirement for an Electron Beam lithography system which has an acceleration voltage of at least 200 kV. It must be capable of the following: a) Ultra-fine line lithography: 3 nm linewidth, using commercially available resists. This can be obtained by its single-nm digit beam diameter. b) Ultra-high position accuracy: This can be obtained by a laser interferometer with Å (sub-1 nm) reading resolution, enabling a stitching accuracy of ±8 nm and overlay accuracy of ±8 nm. c) Uniform fine pattern writing over entire field: Uniform nm-scale lines can be drawn from edge to edge across a large field (≥2000μm) without the need for stitching. This guarantees better accuracy, eliminates the need for stage movement, and enhances writing speed and throughput. d) High throughput lithography: This will be enabled by a 125 MHz (or higher) high-speed deflection system coupled with a new electron beam column design. e) Wafer scale (& multi wafer) processing: Single cassette auto…
About the supplier
JEOL UK Ltd: every public contract they have won, plus their Companies House record (company 00939456).